THIN FILM ACCELERATED LIFE TESTS.
Abstract
The purpose of the program is to study, investigate, and develop test and measurement techniques for controllably accelerating the aging processes in tantalum thin film R-C networks, and to study and investigate the physics of failure associated with the R-C networks. The initial phase of the program included a review of related literature, the construction of individual tantalum thin film resistors and capacitors, accelerated testing of these structures, and failure mechanism determination. A number of failure modes were determined as a result of testing and analysis of the individual resistors and capacitors. There are indications that three basic failure mechanisms are related to all failures and are the failure rate controlling mechanisms; they are: (1) oxidation, (2) ion migration, and (3) crystallization (both fieldinduced and temperature induced). Some rate information was determined on the oxidation mechanism. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1965
- Accession Number
- AD0619689
Entities
People
- M. J. Walker
- M. Sharp