DESIGN AND CONSTRUCTION OF A BAKEABLE SPUTTERING APPARATUS.

Abstract

The construction and testing of an apparatus for studying sputtering is described. The apparatus consists of a duoplasmatron ion source, analyzing magnet, deceleration system, and target chamber. Temperature cycling of the entire system to 400C can be tolerated. The operations of the ion source, analyzing magnet, and deceleration system are described individually and as a system. A target holder bakeable to 400C with two degrees of rotational freedom is described. A short feasibility study is included of an ultra violet ionization source capable of ionizing sputtered atoms. (Author)

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1965
Accession Number
AD0620002

Entities

People

  • Roman Laubert

Tags

DTIC Thesaurus Topics

  • Charged Particles
  • Construction
  • Deceleration
  • Feasibility Studies
  • Ion Sources
  • Ionization
  • Ions
  • Sputtering

Fields of Study

  • Physics

Readers

  • Control Systems Engineering.
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.