HIGH PERFORMANCE THIN FILMS FOR MICROCIRCUITS (CAPACITORS).

Abstract

A basic hafnium sputtering system was designed and constructed to accommodate a 6 1/2 in. x 6 1/4 in. hafnium cathode. Sputtered hafnium films were deposited on microscope slides and anodized. Over 100 Hf-Hf02-A1 capacitor structures were fabricated and tested. Capacitance per unit area, dissipation factor, and temperature characteristic measurements were taken at 1 kc/s, and the results of these measurements are presented with corresponding data on Ta205 and La2Ti207 for comparison purposes. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1965
Accession Number
AD0623851

Entities

People

  • Franz Huber
  • W. Witt

Tags

DTIC Thesaurus Topics

  • Capacitance
  • Capacitors
  • Dissipation
  • Dissipation Factor
  • Electrical Properties
  • Electricity
  • Films
  • Measurement
  • Microcircuits
  • Microscopes
  • Sputtering
  • Thin Films

Readers

  • Electrical Engineering
  • Software Engineering
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems