ELECTRODEPOSITED MAGNETIC FILM DEVELOPMENT

Abstract

The report describes the development of a closed flux structure which incorporates a plated copper conductor in a thin permalloy sheet. The work included the production of large area samples of high coercivity film uniformly plated on a ground plane structure but separated from it by pinhole free insulation. (Author)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1965
Accession Number
AD0624530

Entities

People

  • Irving W. Wolf
  • L. Banzet
  • N. Ballard

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Air Platforms

DTIC Thesaurus Topics

  • Aluminum Alloys
  • Chemical Etching
  • Chemistry
  • Coatings
  • Composite Materials
  • Current Density
  • Domain Walls
  • Electrodeposition
  • Electrolytic Processes
  • Films
  • Magnetic Films
  • Magnetic Properties
  • Material Degradation Processes
  • Materials
  • Materials Processing
  • Materials Science
  • Metal Films

Readers

  • Electrical Engineering
  • Structural Dynamics.
  • Superconducting Magnet Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene