INTEGRATED SILICON DEVICE TECHNOLOGY. VOLUME X. CHEMICAL/METALLURGICAL PROPERTIES OF SILICON.

Abstract

A complete set of existing silicon binary phase diagrams and a complete listing of known binary silicides, along with some of their properties, are presented in convenient reference form. Reactions of silicon with common reagents are summarized, emphasizing those reactions dominant in the chemical etching and polishing of silicon. A technique for spin-etching silicon wafers is also described. (Author)

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1965
Accession Number
AD0626985

Entities

People

  • B. N. Padnos

Organizations

  • RTI International

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Etching
  • Diagrams
  • Etching
  • Fabrication
  • Manufacturing
  • Phase
  • Phase Diagrams
  • Polishing

Fields of Study

  • Materials science

Readers

  • Business Analytics
  • Thin Film Deposition Science.