THE PERFORMANCE OF SIO SOURCE (NAFI IF-1008) IN SINGLE-CHAMBER VACUUM SYSTEMS.

Abstract

An evaporation source for deposition of silicon monoxide thin films was reported to possess high raw material capacity and high evaporation rate characteristics. The source design was evaluated in two different laboratory bell jar vacuum systems and was found to be unsatisfactory. (Author)

Document Details

Document Type
Technical Report
Publication Date
Dec 13, 1965
Accession Number
AD0628664

Entities

People

  • W. C. Underwood

Organizations

  • Naval Air Warfare Center, Indianapolis

Tags

DTIC Thesaurus Topics

  • Buildings And Structures
  • Evaporation
  • Films
  • Materials
  • Materials Laboratories
  • Monoxides
  • Oxide Films
  • Research Facilities
  • Thick Films
  • Thin Films

Readers

  • Software Engineering
  • Systems Analysis and Design
  • Thin Film Deposition Science.