THE LOW PRESSURE OXIDATION OF COPPER SINGLE CRYSTALS

Abstract

The objective of this research was to determine the mechanism of the low pressure thermal oxidation of copper, from an investigation of (1) the oxide and metal topography, (2) the structural relationships of oxide and metal, (3) the kinetics of the nucleation and growth of the islands of reaction product (nuclei). The system, copper plus oxygen, was chosen for study for two main reasons. One was that it had recently been shown that nucleation of oxide occurred on copper over a wide range of easily obtainable conditions. The second reason was that copper had previously been used for oxidation studies in this laboratory and techniques had been developed for the preparation and handling of large single crystal samples.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1965
Accession Number
AD0629903

Entities

People

  • Don F. Mitchell
  • Kenneth R. Lawless

Organizations

  • University of Virginia

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Synthesis
  • Chemistry
  • Copper
  • Crystal Structure
  • Diffraction
  • Electron Diffraction
  • Electron Microscopes
  • Electron Microscopy
  • Equations
  • Geometry
  • High Temperature
  • Materials
  • Materials Science
  • Measurement
  • Oxide Films
  • Solid State Physics
  • Two Dimensional

Readers

  • Materials Science and Engineering.
  • Surface Engineering/Surface Coating Technology.
  • Systems Analysis and Design