ANALYSIS AND DESIGN OF A MACHINE-SCAN ELECTRON BEAM DEVICE.

Abstract

Electron beams can be used to perform a dual role in the fabrication of microcircuits. An electron source may be pulsed to provide a beam capable of machining materials, or alternately, to provide a low current beam for scanning electron image formation. If the beam is pulsed to high and low intensities at a sufficiently fast rate, it is possible to obtain a continuous picture of a bombarded specimen being machined. This paper presents the results of a study concerned with the design of a machine-scan electron beam device to perform the above operation. Theoretical calculations are coupled with experimental observations in order to design a suitable device, and a performance analysis on this apparatus is presented. The recommendations deal specifically with improvements on the device for further research. (Author)

Document Details

Document Type
Technical Report
Publication Date
Mar 08, 1966
Accession Number
AD0630408

Entities

People

  • R. B. Fair

Organizations

  • Pennsylvania State University

Tags

DTIC Thesaurus Topics

  • Electron Beams
  • Electrons
  • Fabrication
  • Intensity
  • Machines
  • Machining
  • Manufacturing
  • Materials
  • Microcircuits
  • Observation
  • Scanning

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Molecular Photonics/Laser Physics
  • Systems Analysis and Design

Technology Areas

  • Directed Energy
  • Microelectronics