PHOTOMETALLIC PROCESS INVESTIGATION.
Abstract
The project has as its ultimate objective the fabrication of microminiature circuits in gold, nichrome, aluminum and silica by a process in which these materials are etched directly by a photosensitive material according to an incident light pattern. Potential light sensitive halogens, sulfides and cyanides have been evaluated in liquid solvents. The capability of such materials as photoetchants has been demonstrated. Such materials as iodoform, N-bromosuccinimide, N,N' dibromodimethylhydantoin, N-chlorosuccinimide, ferric chloride and potassium ferrocyanide show the most promise. Thirtyseven compounds were investigated. Nineteen of these were positive etchants for gold. Eight were positive etchants for nichrome. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 16, 1966
- Accession Number
- AD0631330
Entities
People
- Donald L. Schaefer
Organizations
- General Electric