THIN FILM TECHNIQUES FOR SILICON INTEGRATED CIRCUITS.

Abstract

Resistance of electron beam evaporated cermet films was extended to 30,000 ohms/sq. Using the 30 percent A12O3, 70 percent (TaSi and Cr3Si) powder, reproducibility of cermet deposition is being determined. Series of experiments on sputtered tantalum-silicon resistor films were initiated. Concentric circle 50-ohm resistors were fabricated for the ultrahigh frequency measurements experiments. Reactively sputtered Ta2O5 and SiN2 capacitors to 1.5 pf/sq mil and 0.5 pf/sq mil, respectively. 1000 hour 200C storage tests were completed on 100 IC892 resistor-transistor -capacitor units. IC772 circuit performance was reviewed using 200 ohms/sq and 2500 ohms/sq resistors. IC772 was redesigned to include coupling capacitor. Circular 50-ohm thin film resistor characteristics were measured up to 1000 MHz. (Author)

Document Details

Document Type
Technical Report
Publication Date
May 01, 1966
Accession Number
AD0633777

Entities

People

  • F. Mancini
  • L. E. Terry

Organizations

  • Motorola Mobility

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Capacitors
  • Circuits
  • Electrical Resistance
  • Electron Beams
  • Film Resistors
  • Films
  • Frequency
  • Integrated Circuits
  • Resistance
  • Resistors
  • Thin Film Resistors
  • Thin Films
  • Transistors
  • Ultrahigh Frequency

Readers

  • Integrated Circuit Design and Technology.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems