AN EVALUATION OF A BAKEOUT PROCEDURE FOR SMALL GLASS ULTRAHIGH VACUUM SYSTEMS,
Abstract
A bakeout procedure for small glass ultrahigh vacuum systems is described which insures pressures well below 10 to the minus 11th power Torr. An optically dense zeolite trap and a valve were placed between diffusion pump and system. The trap was baked whenever it was loaded with gas, i.e., after glassblowing, system bakeout, and outgassing of the ion gauges. The valve between trap and system was kept closed during bakeout of the trap. During bakeout of the system, outgassing of the ion gauges, and regular operation of the system, the trap was refrigerated at liquid nitrogen temperature. The observed partial pressures are given. Atmospheric He diffusing through the Pyrex glass and H2 diffusing out of metal parts were the dominant residual gases. CO production during O2 admission was small in comparison to processing without use of the isolation valve. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1966
- Accession Number
- AD0634592
Entities
People
- Fortunat Steinrisser
Organizations
- University of Illinois Urbana–Champaign