CHROMIUM MASKS FOR MICROCIRCUITRY.
Abstract
A method for preparing durable chromium films which may be used as masks in making photoresist patterns for microcircuitry has been developed. Films deposited by this method were found to have excellent adhesion to glass and silicon and produced good uniform and reproducible patterns. A technique for etching chromium films was developed using a photoresist process and an acid and metal etchant. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1966
- Accession Number
- AD0634762
Entities
People
- Alex Rogel
Organizations
- United States Army Communications-Electronics Command