PHOTOMETALLIC PROCESS INVESTIGATION.
Abstract
The project has as its ultimate objective the fabrication of microminiature circuits in gold, nichrome, aluminum and silica by a process in which these materials are etched directly by a photosensitive material according to an incident light pattern. The evaluation of potential light sensitive halogens was extended. Spectrophotometric studies of chloro, bromo and iodo systems for etching gold were conducted. Etchant products are identified and etching mechanisms are proposed. Studies of the compatibility of polymers, solvents, and photo etchants were conducted. Reaction rate studies were initiated. The production of circuit patterns in gold and nichrome by several photometallic systems was demonstrated. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 14, 1966
- Accession Number
- AD0635143
Entities
People
- D. L. Schaefer
- J. F. Burgess
Organizations
- General Electric