PRODUCTION ENGINEERING MEASURES (PEM) FOR MILLIWAT LOGIC SEMICONDUCTOR INTEGRATED CIRCUITS.
Abstract
Investigation continued on the use of larger double-epitaxial slices for the milliwatt logic process, including the creation of special masks and handling equipment. In order to improve epitaxial film thickness and resistivity, a new reactor was installed, tested, and evaluated. More than twice as many slices are being produced with the new reactor. Assembly flow was improved by installing a two-unit magnetic heater on all bonding machines, adding a process for nickel and duplex gold plating headers to reduce discoloration, and implementing improved techniques for checking temperature and pressure on the bonding machine. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 30, 1965
- Accession Number
- AD0635812
Entities
People
- D. W. Brooks
- J. D. Simpson
Organizations
- Texas Instruments