SILICON, PNP, MEXA TRANSISTOR TYPES JAN 2N328A AND JAN 2N329A.

Abstract

Experimental lost of MEXA Transistors incorporating the following programmed process improvements were fabricated in the engineering laboratory and submitted for reliability evaluation. The subtle epitaxial wafer material problem encountered during the first quarter of performance was corrected by the application of replacement material, i.e., wafers from a subsequent lot of purchased material which precluded channeling. Recurrence of the difficulty is expected to be avoided by qualifying each material shipment prior to production until material confidence has been restored. The evaluation results of Lots A through H incorporating the Isolation Diffusion and Spray Etch process improvements indicate substantial improvement in device reliability. Lots I through M are now being evaluated for reliability results. (Author)

Document Details

Document Type
Technical Report
Publication Date
May 29, 1966
Accession Number
AD0636762

Entities

People

  • Frank Chien
  • Sidney Wiesner

Organizations

  • RTX

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Buildings And Structures
  • Diffusion
  • Electronics Laboratories
  • Engineering
  • Materials
  • Materials Laboratories
  • Performance (Engineering)
  • Production
  • Production Engineering
  • Production Management Methods
  • Reliability
  • Research Facilities
  • Test And Evaluation
  • Transistors

Readers

  • Semiconductor Device Technology
  • Systems Analysis and Design