METALLURGICAL RESEARCH AND DEVELOPMENT FOR CERAMIC ELECTRON DEVICES
Abstract
Fifteen special 94% and 99% alumina ceramics in the system SiO2-CaO- Al2O3 with a SiO2/CaO ratio of 1:1 and 2:1 were fabricated and their behavior characterized. It was tentatively established that the rate determining mechanism of alumina solution both during the initial processing of the ceramic and during its subsequent reaction during metallizing with refractory metal paints containing oxide additions, was the chemical reaction rate. Lucalox, sapphire, beryllia and fused quartz vacuum tight seals were made and their sealing mechanisms were examined as were those of several commercial alumina ceramics. It was established that chemical and/or semiconducting bond mechanisms were responsible for the actual sealing process of refractory metal to the oxide substrate. The electrical studies included dc resistance measurements, low power rf conduction and dielectric loss studies, and high power loss studies. In addition to usage on high power klystrons, the low loss metallizing development in this study can profitably be used on planar triodes and reflex klystrons.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1966
- Accession Number
- AD0636950
Entities
People
- C. Barnes
- L. Reed
- Rick McRae
- S. Vogel
- W. Wade