THE PREPARATION AND CHARACTERIZATION OF DIRECT CURRENT AND ASYMMETRIC PERIODIC REVERSE CURRENT ELECTRODEPOSITS OF EPITAXIAL COPPER.

Abstract

Single crystal epitaxial deposits of copper have been electrodeposited on (100) oriented single-crystal copper substrates using both direct current and asymmetric periodic reverse current methods. It was found that the degree of crystalline perfection is approximately the same for both methods and reflects the substrate perfection. The epitaxial growth and perfection of the deposits are not appreciably affected by dissolved lead impurities in the electrolyte over the range 0.25 to 100 parts per million of lead. The reverse current deposits have a considerably larger crystallite size which is attributed to a lower effective rate of nucleation. (Author)

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1966
Accession Number
AD0640643

Entities

People

  • Bernard Rubin
  • John J. O'connor
  • Reynold Spector

Organizations

  • Air Force Cambridge Research Laboratories

Tags

DTIC Thesaurus Topics

  • Coatings
  • Crystallites
  • Crystallization
  • Crystals
  • Deposition (Materials Processing)
  • Direct Current
  • Electrodeposition
  • Electrolytes
  • Electrolytic Processes
  • Epitaxial Growth
  • Impurities
  • Material Coating Processes
  • Materials Processing
  • Single Crystals
  • Substrates

Fields of Study

  • Materials science

Readers

  • Strategic Security Studies
  • Surface Engineering/Surface Coating Technology.
  • Thin Film Deposition Science.