A HIGH FREQUENCY SEMICONDUCTOR INSTABILITY DUE TO AMBIPOLAR DIFFUSION,
Abstract
A new high frequency semiconductor instability is proposed. The instability arises when a sufficiently strong d. c. electron field is applied to a semiconductor which has a high conductivity and contain both electrons and holes. The d. c. field must elevate the effective electron temperature to about three times the background lattice temperature. The instability is caused by the temperature dependence of the ambipolar diffusion coefficient. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 08, 1966
- Accession Number
- AD0645746
Entities
People
- K. Blotekjaer
- P. Weissglas
Organizations
- Royal Institute of Technology