QUANTITATIVE HIGH TEMPERATURE INFRARED SPECTROSCOPY.
Abstract
The statistical band model was successfully applied to the NO fundamental band at 5.3 microns. The temperature range was 300-800K. Pressures between 0 and 5 atm were applied. The temperature dependence of the band model parameters was established and compared to existing theoretical results. Good agreement was obtained in the temperature range studied. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 31, 1966
- Accession Number
- AD0648664
Entities
People
- U. P. Oppenheim
Organizations
- Technion – Israel Institute of Technology