THEORY OF OHMIC CONTACTS.
Abstract
Contact resistivity of a metal-semiconductor area contact is calculated for 10 to the 18th power - 10 to the 20th power/cu cm doping range, for n-type semiconductors and 0.7 - 1.0 eV barrier heights employing a thermionic-field emission model with neglect of barrier width fluctuation. Application to design of ohmic contact to group IV and III-V semiconductors is indicated. A criterion for an electrically good ohmic contact is proposed and the frequently encountered patchiness problem in practical alloy-contact work is discussed. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1967
- Accession Number
- AD0650738
Entities
People
- Juri Vilms
- Lothar Wandinger
Organizations
- United States Army Communications-Electronics Command