LASER DAMAGE STUDY OF THIN FILMS

Abstract

A concentrated effort was made, during the fourth quarterly period, to increase the laser damage threshold, E sub t, of aluminum oxide films. This objective was approached empirically. Selected vacuum deposition parameters were varied and the effect on E sub t was observed. E sub t for one-quarter wavelength and thirty-three quarter wavelengths films were increased by a factor of two over previously reported values. The one-half wavelength threshold was increased by a factor of six over the previous value. The one-quarter wavelength threshold spontaneously fell to half its original value two days after manufacture.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 1967
Accession Number
AD0651988

Entities

People

  • Arthur F. Turner
  • Stanley J. Refermat

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum
  • Aluminum Oxides
  • Boundaries
  • Contracts
  • Electron Guns
  • Films
  • Laser Damage
  • Measurement
  • Oxide Films
  • Oxides
  • Oxygen
  • Power Levels
  • Refraction
  • Refractive Index
  • Thin Films
  • Vacuum
  • Vacuum Deposition

Fields of Study

  • Physics

Readers

  • Mathematics or Statistics
  • Spectroscopy.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition