HETEROJUNCTION DEVICES.

Abstract

Heterojunctions were prepared by depositing Si epitaxially onto GaAs and GaP substrates using silicon-tellurium compounds as transporting agents. The experimental results are in agreement with the abrupt junction theory for heterojunctions. A quantitative discussion is given for electron tunneling through a Schottky Barrier. An open tube deposition system is described for use in the epitaxial deposition of III-V compounds. Associated water transport problems are discussed. Improvements have been made on a closed tube epitaxial system. A phenomelogical model of the transport and deposition has been formulated which predicts that the ampoule geometry has an appreciable influence on the deposition and may be used as a parameter in the design of an epitaxial system. (Author)

Document Details

Document Type
Technical Report
Publication Date
May 01, 1967
Accession Number
AD0654001

Entities

People

  • David Boyce
  • Girtz Zeidenbergs
  • Mark M. Davis
  • Richard L. Anderson
  • Thomas Huang

Organizations

  • Syracuse University

Tags

DTIC Thesaurus Topics

  • Agreements
  • Alloys
  • Chemical Compounds
  • Electrons
  • Geometry
  • Heterojunctions
  • Metallic Compounds
  • Metalloid Alloys
  • Quantum Tunneling
  • Substrates
  • Tellurium
  • Tellurium Compounds
  • Transport Ships
  • Tunneling

Fields of Study

  • Materials science

Readers

  • Quantum Chemistry
  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene