RADIATION DAMAGE IN SEMICONDUCTORS.
Abstract
Work is reported in the following areas: (1) Photon irradiation enhanced diffusion in germanium at temperatures above 600 degrees C; (2) Photoconductivity of electron-irradiated silicon at 20 degrees K; (3) Low temperature annealing of N-type germanium; (4) Fast annealing of pulse-irradiated germanium (preliminary work in progress).
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 1966
- Accession Number
- AD0657365
Entities
People
- A. Brelot
- J. Bourgoin
- J. Zizine
- K. Matsui
- P. Baruch
Organizations
- École Normale Supérieure