APPLICATION OF THE AUGER PROCESS TO THE STUDY OF GASEOUS ADSORPTION ON TUNGSTEN,

Abstract

Apparatus is described which allows the density of gas adsorbed on metal surfaces to be monitored by observing changes in the number of electrons ejected from the surface by a constant-current, low-energy ion beam. It is shown that the electron emission process (an Auger process) is temperature independent; thus, surface coverages may be easily compared at different temperatures. Adsorption at room temperature and at the temperature of liquid nitrogen was studied by flash filament and Auger techniques. Desorption kinetics of H2, CO, and N2 from polycrystalline, (110), and (111) tungsten foils are discussed.

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1967
Accession Number
AD0658072

Entities

People

  • Gary Tibbetts

Organizations

  • University of Illinois Urbana–Champaign

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Adsorption
  • Charged Particles
  • Desorption
  • Electron Emission
  • Electrons
  • Elementary Fermions
  • Elementary Particles
  • Emission
  • Fermions
  • Filaments
  • Ion Beams
  • Ions
  • Kinetics
  • Leptons
  • Metals
  • Photoexcitation
  • Tungsten

Fields of Study

  • Physics

Readers

  • Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene