A METHOD OF PREPARING DIELECTRIC FILMS,

Abstract

A powder spray method is described for preparing dielectric films on a silicon dioxide base in a vacuum chamber. To decrease the temperature of vaporization of silicon dioxide without damaging any properties of the dielectric film, a mixture of silicon dioxide and lanthanum, taken in equipolar quantities, is used. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jul 27, 1967
Accession Number
AD0667640

Entities

People

  • G. A. Blinov
  • V. S. Krikorov

Organizations

  • National Air and Space Intelligence Center

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chambers
  • Dielectric Films
  • Dioxides
  • Elements
  • Films
  • Lanthanum
  • Silicon
  • Silicon Dioxide
  • Transition Temperature
  • Vacuum
  • Vacuum Chambers
  • Vaporization

Readers

  • Thin Film Deposition Science.