A PARAMETRIC STUDY OF THIN FILMS OF TANTALUM-NITROGEN COMPOUNDS.

Abstract

Thin films of tantalum-nitrogen compounds were deposited by reactive sputtering onto quartz substrates for electrical and optical measurements and onto carbon-coated grids for electron diffraction analysis using hot- and cold-stage techniques. The films were deposited at substrate temperatures varying from room temperature to 500C at sputtering voltages varying from 1 to 5 kV. The relationship between nitrogen content and lattice structure is presented and compared with resistivity and optical absorption measurements. (Author)

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1968
Accession Number
AD0669053

Entities

People

  • E. A. Buvinger

Organizations

  • Air Force Research Laboratory

Tags

DTIC Thesaurus Topics

  • Diffraction
  • Diffraction Analysis
  • Electron Diffraction
  • Electron Microscopy
  • Electrons
  • Films
  • Measurement
  • Microscopy
  • Nitrogen
  • Nitrogen Compounds
  • Optical Absorption
  • Sputtering
  • Substrates
  • Tantalum
  • Thin Films

Fields of Study

  • Materials science

Readers

  • Reinforced Composite Materials
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene