GROWTH, PROCESSING AND CHARACTERIZATION OF BETA-SILICON CARBIDE SINGLE CRYSTALS,
Abstract
Vapor deposition of beta-silicon carbide on (111) beta-silicon carbide platelets is being studied using methyltrichlorosilane or mixtures of silane and propane. Although epitaxial deposits were achieved with either source gas, low octahedral steps (triangles) and numerous intergrown star-shaped hillocks on the alternate side usually occur. Process conditions were systematiclaly varied to improve the surface perfection, and n-type epitaxial layers with smooth surfaces free of hillocks were grown on n-type beta-silicon carbide crystal substrates using CH3SiCl3. Epitaxial deposits of n-type beta-silicon carbide were grown on aluminum-doped p-type silicon carbide substrates, and p-type epitaxial deposits were grown on n-type crystals using diborane for p-doping during vapor deposition. Processing of diodes requires a suitable etching procedure. Hydrogen etching through thermally grown oxide masks was not successful because of reduction of the oxide. Construction of apparatus for oxygen/chlorine etching of silicon carbide at modest temperature using oxide masking is ninety percent complete. A crude electroluminescent, epitaxial diode was demonstrated using a beta-silicon carbide crystal consisting of a p-type epitaxial layer deposited on an n-type substrate. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1968
- Accession Number
- AD0669099
Entities
People
- Robert A. Mueller
- Robert W. Bartlett
Organizations
- SRI International