CHEMICAL VAPOR DEPOSITED MATERIALS FOR ELECTRON TUBES.
Abstract
Microwave tests of etched patterns of a conductor on a dielectric substrate have shown that fine-lined, ruled structures can provide slow-wave circuits of the Karpline type when the assembly is uniform over its length. Tests have shown that grid spacers can easily be made of high-density isotropic CVD BN by using an air abrasive unit. Several isotropic CVD BN depositions to fabricate cylindrical microwave windows were made with uniformly good results. Isotropic CVD BN materials with densities both higher and lower than standard isotropic CVD BN were prepared in small quantities. Preliminary measurements have shown that certain of these materials may be more desirable for some applications than standard isotropic CVD BN. High-density isotropic CVD BN can be prepared by reducing reactant concentrations but the deposition rate is low. Increased density, together with increased deposition rate, appears possible with proper control of critical deposition parameters. Good results were obtained with a special metallizing tape (88% ZrH2-12% Ni) on boron nitride, but since the air prefiring is critical, this tape technique may be abandoned. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1968
- Accession Number
- AD0672095
Entities
People
- H. Schilling
- J. Pappis
- Jamesina Simpson
- S. R. Steele
Organizations
- RTX