STRUCTURAL CHARACTERIZATION OF THIN ALUMINUM OXIDE-HYDROXIDE LAYERS BY THE ALUMINUM AND OXYGEN X-RAY EMISSION BANDS

Abstract

A new technique is outlined for the characterization of thin films of crystalline and amorphous aluminum oxides, aluminum oxyhydroxides and aluminum hydroxides. Shifts in Al K-beta and OK-alpha X-ray emission lines of known examples of these compounds are presented and are used to identify unknown Al-O- OH compounds.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1968
Accession Number
AD0673299

Entities

People

  • E. W. White
  • G. A. Savanick
  • P. Gigl

Organizations

  • Pennsylvania State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Abstracts
  • Aluminum Compounds
  • Aluminum Oxides
  • Chemistry
  • Contracts
  • Energy Bands
  • Energy Levels
  • Engineered Materials
  • Films
  • Governments
  • Hydroxides
  • Materials
  • Spectra
  • Standards
  • Thin Films
  • United States Government
  • X Rays

Fields of Study

  • Physics

Readers

  • Spectroscopy.
  • Thin Film Deposition Science.