BASIC PLASMA PROCESSES.

Abstract

Measurements of the magnitude and wavelength dependence of the specular reflection of light in the vicinity of the cesium resonance lines from a cesium-sapphire interface verify the Taylor-Langmuir formula for the vapor pressure of cesium in the temperature range from 500 to 600K. This result eliminates the Cs density as a source of systematic error in our previous measurements of the self-broadening of the Cs resonance lines at 8521 and 8944A. Measurements have been made of the total amount of diffusely scattered resonance radiation for pure Cs and for Cs-nitrogen mixtures at Cs densities between 10 to the 14th power and 10 to the 16th power atom/cu cm. A preliminary analysis of this data shows that the method is capable of yielding quenching cross sections at high alkali vapor densities. Some features of the results, such as the apparent quenching caused by pure Cs, are not yet understood. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1968
Accession Number
AD0674120

Entities

People

  • Arthur V. Phelps
  • C. L. Chen

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Measurement
  • Nitrogen
  • Pressure Measurement
  • Quenching
  • Radiation
  • Reflection
  • Resonance
  • Resonance Radiation
  • Sapphire
  • Specular Reflection
  • Vapor Pressure

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics
  • Plasma Physics.
  • Spectroscopy.