SPUTTERING OF METALLIC SURFACES AT ENERGIES BETWEEN 100 TO 5,000 ELECTRON VOLTS,
Abstract
The erosion or sputtering of metallic surfaces by xenon ions at normal incidence with kinetic energies ranging from 100 to 5,000 electron-volts is reported. The energy dispersion of the ion beam is shown to be less than 5 e.v. and the number of atoms ejected from the target per impinging ion is measured by means of the crystal oscillator method of McKeown. Using this very sensitive mass-measuring technique it is possible to measure yields at one energy for less than a minute of bombardment time. Ion fluxes of about 10 to the 12th power ions per second per square centimeter are generated. Preliminary measurements were obtained for cesium sputtering. The experimental technique, procedure, and results are discussed. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 11, 1961
- Accession Number
- AD0678150
Entities
People
- A. Y. Cabezas
- D. Mckeown
Organizations
- General Dynamics