A VANADIUM OXIDE FILM 'SWITCHING' ELEMENT.
Abstract
Vanadium dioxide films were sputtered onto alumina substrates by a radio-frequency method. The films were heat-treated at 600C to insure good crystallinity. At 68C, the resistivity changed sharply at this so-called metal-semiconductor transition temperature. The resistance of the films can also be 'switched' under an applied voltage through essentially a thermal process. For an applied voltage of 200 volts, for instance, the estimated transition time is of the order of a fraction of a microsecond. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1969
- Accession Number
- AD0683368
Entities
People
- F. M. Collins
- T. N. Kennedy
Organizations
- Rensselaer Polytechnic Institute