THE OXIDATION MECHANISM OF NICKEL SILICON ALLOY

Abstract

Thermogravimetric techniques have been used to study oxidation of nickel alloys containing 0.1 to 3.2 wt % silicon at temperatures up to 1300C. Due to the appearance of internal oxidation the effect of silicon addition on the oxidation process was complex. The thermograms showed a simple curve for lower silicon content, but two consecutive curves for higher content. The oxidation mechanism was interpreted in terms of isothermal kinetics and the corresponding structural changes.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1968
Accession Number
AD0683609

Entities

People

  • Fumihiko Saegusa

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Alloys
  • Chemical Reactions
  • Diffraction
  • Electron Diffraction
  • Elements
  • Heat Of Activation
  • Kinetics
  • Materials
  • Metals
  • Nickel
  • Nickel Alloys
  • Oxidation
  • Oxidation Resistance
  • Precipitation
  • Silicon Alloys
  • Solid Solutions
  • X Rays

Fields of Study

  • Materials science

Readers

  • Combustion science or combustion engineering.
  • Materials Science and Engineering.
  • Organic Chemistry