NEW VACUUM EQUIPMENT FOR DEPOSITING THIN FILMS,
Abstract
A new device for depositing thin metal films in a vacuum is presented, and its application for depositing thin film electrodes on quartz resonators is discussed in detail. The apparatus permits elements to be coated and sealed without exposing them to the atmosphere and makes possible electrodes of any configuration. It can also be used to adjust oscillation frequency to nominal. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 21, 1969
- Accession Number
- AD0695888
Entities
People
- E. V. Churkin
- V. A. Yugov
Organizations
- National Air and Space Intelligence Center