VACUUM DEPOSITION OF THIN FILMS,
Abstract
The book deals with methods of obtaining and processing thin films, methods of measuring the deposition rate and thickness of thin-film layers, and the main fields of application of thin films. Vacuum requirements and the requirements for the composition of the residual medium in thermal evaporation and cathode sputtering are given, and modern methods of producing and measuring vacuums and the equipment used in obtaining thin films are described. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 15, 1969
- Accession Number
- AD0698108
Entities
People
- B. S. Danilin
Organizations
- National Air and Space Intelligence Center