INTERACTION OF DISLOCATIONS WITH ELECTRONS AND WITH PHONONS,

Abstract

The interaction parameter, B, of moving dislocations with electrons and with phonons in aluminum was determined in the temperature range 10 degrees K to 250 degrees K. A new technique was developed for measuring ultrasonic attenuation changes, the change in alpha, as a function of a dynamic bias stress. The numerical values of B were obtained from an analysis of the change in alpha, which does not require any knowledge of dislocation density or of other inaccurately known features of the dislocation network. The results indicate that the dislocation interaction with electrons is temperature independent and the interaction with phonons increases with increasing temperature. These results are consistent with theoretical predictions. (Author)

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1970
Accession Number
AD0709940

Entities

People

  • A. Hikata
  • C. Elbaum
  • R. A. Johnson

Organizations

  • Brown University

Tags

DTIC Thesaurus Topics

  • Aluminum
  • Attenuation
  • Dislocations
  • Electrons

Readers

  • Mechanical Engineering/Mechanics of Materials.
  • Plasma Physics.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Microelectronics