STUDIES OF THIN FILM HARD SUPERCONDUCTORS.
Abstract
Superconducting thin nitride films have been prepared by reactive sputtering. The films have very high superconducting T sub c's and excellent (J sub C)-H characteristics. The superconducting properties and the electrical resistivities of these films were studied as a function of sputtering parameters such as nitrogen partial pressure, deposition rate, substrate temperature and substrate materials. The properties of the films were then related to the structure of the films by electron microscopy studies. The effects of annealing the films were studied. Electrical resistivities and the temperature coefficient of the resistivities were determined. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1970
- Accession Number
- AD0710960
Entities
People
- Louis E. Toth
- Y. M. Shy
Organizations
- University of Minnesota