A Method for the Layer Mass Spectral Analysis of Thin Semiconductor Films,
Abstract
Semiconductors and metallic films are interesting subjects of various kinds of investigations dictated both by theoretical and by purely practical considerations. The development of quantitative methods for the analyses of basic components and admixtures in thin films of material, and also the investigation of the regularity of their distribution, is one of the most important problems presented by solid-state physics and film technology to analytical chemistry. In this connection, attempts are made to use spectral and radio-activation methods of analysis.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1971
- Accession Number
- AD0724168
Entities
People
- G. I. Ramendik
- M. S. Chupakhin