RF Sputtering of Zinc Sulphide,
Abstract
The report describes the work that was done for a period of eight months on the RF sputtering of zinc sulphide doped thin films on to silicon. Details of the sputtering process and an assessment of equipment improvements are included. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1970
- Accession Number
- AD0729543
Entities
People
- R. J. Woodward