Capacitance-Voltage Characteristics of Metal Barriers on p-PbTe and p-InAs: Effects of the Inversion Layer.
Abstract
The dependence of the capacitance C on the voltage is derived for metal-semiconductor barriers in which there is a strong inversion layer at the metal-semiconductor interface, a case of interest in the study of surface effects and in applications for laser structures. Experimental results for evaporated lead and tin barriers on p-PbTe at 77K and for evaporated gold barriers on p-InAs at 77K and 4.2K are presented and compared to calculations performed with the inversion layer model. Both the theory and experiment show an essentially linear dependence of 1/C squared with voltage, as in the usual Schottky barrier, but a voltage intercept which is surprisingly dependent on band structure parameters, bulk carrier concentration and temperature. Reasonable quantitative agreement between the theory and experiment is obtained. In all cases the presence of a strong inversion layer can be clearly established. The analysis of the capacitance-voltage data, however, gives only a lower limit to the amount of inversion present. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1971
- Accession Number
- AD0730088
Entities
People
- James N. Walpole
- Kenneth W. Nill
Organizations
- Massachusetts Institute of Technology