Chemical Vapor Deposition Study.

Abstract

The report discusses research on chemically vapor deposited (C.V.D.) tungsten. It was of interest to learn the mechanism by which the WF6 molecule was reduced by H2 on the substrate and also what was the mechanism by which the deposit grew. The effect of annealing on the mechanical properties of C.V.D. tungsten was studied in the temperature range of 800 to 1600C by hoop stress tests.

Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1971
Accession Number
AD0734212

Entities

Organizations

  • University of Utah

Tags

DTIC Thesaurus Topics

  • Annealing
  • Chemical Vapor Deposition
  • Deposition (Materials Processing)
  • Material Coating Processes
  • Materials Processing
  • Mechanical Properties
  • Molecules
  • Stress Tests
  • Substrates
  • Tungsten
  • Vapor Deposition

Readers

  • Mechanical Engineering/Mechanics of Materials.
  • Thin Film Deposition Science.