Newtonian Limit for Viscosity Measurements of KMER Photoresist Solutions.

Abstract

Rapid measurements of the viscosity of photoresist solutions, that are being performed as part of process control in integrated circuit technology, are usually based on methods, such as the Ostwald-Cannon-Fenske viscometer, which apply only to Newtonian liquids. The present investigation was, therefore, designed to determine the range of dilutions for Kodak Metal-Etch Resist for which the solution becomes non-Newtonian. The results presented indicate that non-Newtonian behavior occurs only at mixtures with thinner concentrations above 10 percent, and that for most photoresist applications, non-Newtonian behavior need not be considered. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1972
Accession Number
AD0737596

Entities

People

  • David W. Yarbrough
  • Edward A. Shires
  • Herbert L. Mette

Organizations

  • United States Army Communications-Electronics Command

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Circuits
  • Dilution
  • Integrated Circuits
  • Measurement
  • Measuring Instruments
  • Viscometers
  • Viscosity

Readers

  • Analytical Chemistry
  • Fluid Dynamics.
  • Nanofabrication and Microfabrication.