High-Brightness Electroluminescent Diodes.

Abstract

The purpose of the investigation discussed in this report was to prepare In(1-x)Ga(x)P material from which high-brightness electroluminescent diodes could be made. Throughout the course of the investigation, three growth techniques were used to prepare material for this purpose. The authors examine in detail the energy band structure of In(1-x)Ga(x)P. In the next section, In(1-x)Ga(x)P prepared by a zone-leveling and a traveling-solvent growth technique is considered. The fabrication and characteristics of p-n junctions formed by Zn diffusion into n-type melt-grown In(1-x)Ga(x)P are treated also. The principles of vapor-phase growth, and many refinements in this technology have been carried out. The high-brightness diodes and orange-light-emitting junction lasers mentioned above are described in detail.

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1972
Accession Number
AD0740183

Entities

People

  • Andrew G. Sigai
  • Charles J. Nuese
  • Irwin Kudman

Organizations

  • RCA Corporation

Tags

DTIC Thesaurus Topics

  • Advanced Materials
  • Band Structures
  • Brightness
  • Diffusion
  • Energy Bands
  • Engineered Materials
  • Fabrication
  • Leveling
  • Materials
  • P-N Junctions
  • Phase
  • Physical Properties
  • Plasmonic Materials
  • Vapor Phases

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology

Technology Areas

  • Directed Energy