Method for Cleaning Semiconductors Surfaces,

Abstract

The purpose of the invention is to elaborate the method of cleaning the surface of semiconductors in a hydrogen-containing protective atmosphere, which method could be applied as an independent process or conjointly with another process, e.g., fusion, vaporization, and which should make possible a considerably more effective cleaning of the surface of semiconductors.

Document Details

Document Type
Technical Report
Publication Date
Apr 04, 1972
Accession Number
AD0743656

Entities

People

  • Ireneusz Wojcik
  • Jerzy Pultorak

Organizations

  • National Air and Space Intelligence Center

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Atmospheres
  • Carbides
  • Chemical Compounds
  • Compound Semiconductors
  • Electronics
  • Hydrogen
  • Inorganic Carbon Compounds
  • Inorganic Chemicals
  • Intellectual Property
  • Inventions
  • Law
  • Patents
  • Semiconductors
  • Solid State Electronics
  • Vaporization

Readers

  • Semiconductor Device Technology
  • Surface Coatings Technology.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene