New Compounds for Use in HF Lasers.

Abstract

A study was conducted to find new F and H containing compounds that would produce lasing in electrically pulsed HF chemical lasers. The emphasis in the study was on seeking economical, safe, and storable chemicals. Spectroscopic analyses of the lasing outputs were made. The compounds included CH3CHF2, NF3, IF5, SF6, PR5, CF4, C3F8, SiF4, SO2F2, and SOF2. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1972
Accession Number
AD0745128

Entities

People

  • David W Taylor
  • Munson A. Kwok
  • Spencer M. King
  • Stanley W. Mayer

Organizations

  • The Aerospace Corporation

Tags

DTIC Thesaurus Topics

  • Amplifiers
  • Chemical Lasers
  • Gas Lasers
  • Hydrogen Fluoride Lasers
  • Lasers
  • Light Amplifiers

Readers

  • Irregular Warfare and Special Operations Cyberspace Operations against Adversarial Threats.
  • Optical Physics and Photonics.
  • Rocket Propulsion.

Technology Areas

  • Directed Energy