Structural Properties of Amorphous Semiconductors by Mossbauer Spectroscopy
Abstract
The Mossbauer technique provides a means for investigating short- range order and order-disorder transitions which are difficult to examine by other techniques. By correlating structural information with sample preparation variables and optical and electronic properties, a significant contribution to understanding the behavior and properties of amorphous semiconductors may be made. Current emphasis is being placed on observing the amorphous to crystalline transition in vacuum deposited Te films. Since crystallization occurs below room temperature (approximately OC), apparatus was constructed to deposit, transfer and examine films maintained at low temperature. crystalline films of tellurium up to 18 microns thick have been deposited on room temperature beryllium substrates and Mossbauer spectra have been obtained.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 30, 1972
- Accession Number
- AD0753272
Entities
People
- Norman Blum
Organizations
- Johns Hopkins University