Chemical Modifications of Silica Surfaces

Abstract

The purpose of the work was to modify the surfaces of silicas by chemical means, i.e. by causing them to react with gaseous or liquid materials under controlled conditions, in order to alter the nature and reactivity of the surfaces. The reactions and the molecular species occurring on the surfaces were monitored by means of infrared spectroscopic techniques. An entirely new type of surface defect has been discovered. The defect has the properties expected for a center consisting of two closely-spaced silicon radicals associated with two anomalously reactive oxygen atoms. The defect responsible for the activity of reactive silica (RS) is best produced by a methoxylation, pyrolysis, degassing procedure.

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Document Details

Document Type
Technical Report
Publication Date
Nov 12, 1972
Accession Number
AD0753391

Entities

People

  • Manfred J. Low

Organizations

  • New York University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Properties
  • Chemistry
  • Electron Spin Resonance
  • High Temperature
  • Materials
  • Military Research
  • New York
  • North Carolina
  • Oxygen
  • Pyrolysis
  • Reactivities
  • Silicon
  • Silicon Compounds
  • Silicon Dioxide
  • Spin Resonance
  • Surface Chemistry
  • Surface Properties

Readers

  • Combustion science or combustion engineering.
  • Electrochemical Engineering/ Fuel Cell Technologies
  • Thin Film Deposition Science.

Technology Areas

  • Space