Laser Mirror Technology.

Abstract

The effects of microroughness, crystalline imperfections, and thin film deposition conditions on the absorption of infrared radiation by laser mirrors are discussed. New instruments described include the Optical Evaluation Facility for measuring absorption and scattering from samples of arbitrary size and curvature, and a modulated ellipsometer for in situ measurements of optical properties of samples under ultrahigh vacuum conditions and conditions of known residual gas environment. Techniques for characterizing surfaces with microirregularities using optical scattering, optical and electron microscopy, and interferometry are described. Initial results obtained using the modulated ellipsometer are discussed, and data obtained from measurements of infrared absorption on silver surfaces of known roughness are presented. (Author)

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1972
Accession Number
AD0754101

Entities

People

  • D. K. Burge
  • H. E. Bennett
  • J. L. Stanford
  • J. M. Bennett
  • K. H. Westmacott

Organizations

  • Naval Air Weapons Station China Lake

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption
  • Electromagnetic Radiation
  • Electron Microscopy
  • Ellipsometers
  • Infrared Radiation
  • Ionizing Radiation
  • Laser Mirrors
  • Lasers
  • Measurement
  • Microscopy
  • Optical Phenomena
  • Optical Properties
  • Radiation
  • Scattering
  • Thin Films
  • Ultrahigh Vacuum

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene