Conduction Mechanisms in Thick Film Microcircuits

Abstract

Results from studies of the resistance of RuO2-glass resistors during firing and of the surface tension of the glass are presented, and their correlation with the proposed model for microstructure development discussed. Studies of the removal of the ethyl cellulose - butyl carbitol screening agent led to the conclusion that the last traces of organic matherials cannot be removed below 500C. An investigation of the drying of RuO2 . xH2O employing DTA and TGA techniques is discussed, and a procedure described for preparing auhydrous RuO2 with suitable particle size range.

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Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1973
Accession Number
AD0756254

Entities

People

  • R. W. Vest

Organizations

  • Purdue Research Foundation

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemistry
  • Electric Charge
  • Electrical Engineering
  • Electrical Properties
  • Ethyl Cellulose
  • Films
  • Materials
  • Materials Processing
  • Materials Science
  • Measurement
  • Organic Materials
  • Oxides
  • Particle Size
  • Particles
  • Resistance
  • Surface Tension
  • Thick Films

Readers

  • Polymer Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene