Evaluation of Multilayer Thin Films. Phase II.

Abstract

Thin films of aluminum and titanium alloys on collodion membranes were bulge tested and the strength of the films was calculated. The values obtained for films less than 500 A thick ranged above 0.5 Mpsi for aluminum and 1 Mpsi for titanium. Unsupported films of aluminum oxide, boron carbide, and silicon nitride were prepared by deposition on a copper foil replica of a glass surface and later dissolving the copper. The strengths of these films were between 4 and 27 kpsi. (Author)

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1973
Accession Number
AD0756582

Entities

People

  • Fred Ordway

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Alloys
  • Aluminum
  • Aluminum Oxides
  • Boron Carbides
  • Carbides
  • Ceramic Materials
  • Chemical Compounds
  • Dissolving
  • Films
  • Membranes
  • Oxides
  • Test And Evaluation
  • Thin Films
  • Titanium
  • Titanium Alloys

Fields of Study

  • Physics

Readers

  • Mechanical Engineering/Mechanics of Materials.
  • Thin Film Deposition Science.